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屏蔽栅 MOSFET 中间氧化膜工艺优化 - 搜狐
2 SGT-MOSFET 中间氧化层工艺分析 传统 U-MOSFET 在深沟槽内只有一层多晶硅,而 SGT-MOSFET 采用的是电荷耦合结构,即 SGT-MOSFET 的深沟槽有两层多晶硅,上层多晶硅为栅极,下层多晶硅为屏蔽电极(耦合电极),连接在源极,如图 1 所示。
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